Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of oxygen impurity in N<(Index)2>, Ar, He, Ne and H<(Index)2> by using a ...
适用范围:The standard should define the test method for determining the content of O<(Index)2> in the carrier and doping gases N<(Index)2>, Ar, He, Ne and H<(Index)2>.#,,#
Testing of materials for semiconductor technology; determination of impurities in carrier gases and dopant gases; determination of C<(Index)1>-C<(Index)3>-hydrocarbons in nitrogen by gas-chromatography...
适用范围:This document specifies a method for the determination of the volume part of C<(Index)1>-C<(Index)3>-hydrocarbons in nitrogen in the range between 0,2 and 10 ?l.#,,#
Testing of materials for semiconductor technology - Method for the characterisation of moulding compounds for electronic components - Part 3: Determination of cationic impurities
适用范围:The document defines a method for the determination of Na, K and CA in moulding compounds for electronic components by analysis of an aqueous extract of the epoxy resin moulding compound by means of th...
Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of water impurity in hydrogen, oxygen, nitrogen, argon and helium by usin...
适用范围:The standard determines a test method for the determination of water impurity in carrier gases and doping gases (H<(Index)>2, O<(Index)2>, N<(Index)2>, Ar, He) used in the semi conductor technology.
Nuclear power plants - Instrumentation and control important to safety - Hardware design requirements for computer-based systems
适用范围:Is applicable to computer-system hardware for systems of Class 1 and 2 (as defined by IEC 61513) in nuclear power plants. This new edition reflects recent developments in computer system hardware desig...
发布日期:2007-08-27 实施日期:2007-08-27
Testing of materials for semiconductor technology; determination of etch rates of etching mixtures; silicium monocrystals; gravimetric method
Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 1: Microscopic determination of particles
适用范围:This method cover the determination of the concentration of particulate matter contamination from liquids isolated on a membrane filter by microscopic counting. The scope is limited to sizing particles...
Packaging of components for automatic handling -- Part 1: Tape packaging of components with axial leads on continuous tapes
适用范围:この規格は,電子機器用アキシャルリード線端子部品のテープによるペッもソグージングについて適用する。通常,部品のリード線端子をテープで固定する。この規格は,自動実装,リード線端子の加工,挿入などの操作を行う装置を用いるテーピングの要求事項について規定する。また,上記の目的のため.部品のテーピング...
Testing of materials for semiconductor technology; Determination of impurities in carrier gases and dopant gases - Part 9: Determination of oxygen, nitrogen, carbonmonxide, carbondioxide, hydrogen and ...
Testing of materials for semiconductor technology; determination of etch rates of etching mixtures; silicium-dioxid coating; optical method
适用范围:The standard defines the test method for the determination of etch rates of etch mixtures on siliciumdioxid coatings.
Nuclear power plants. Instrumentation and control important to safety. Selection and use of industrial digital devices of limited functionality
发布日期:2013-03-31 实施日期:2013-03-31
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