Semiconductor devices - Metallization stress void test (IEC 62418:2010); German version EN 62418:2010
实施日期:2010-12-01
Standard Test Method for Galling Resistance of Materials
适用范围:<p>This test method is designed to rank material couples in their resistance to the failure mode caused by galling and not merely to classify the surface appearance of sliding surfaces.</p> <p>This tes...
实施日期:2002-11-10
实施日期:2011-09-16
Aerospace series - Metallic parts - Inducement compressive surface stresses - Steel shot, glass beads and ceramic beads.
实施日期:2006-06-01
Standard Test Method for Galling Resistance of Material Couples
适用范围:<p>This test method is designed to rank material couples in their resistance to the failure mode caused by galling and not merely to classify the surface appearance of sliding surfaces.</p> <p>This tes...
实施日期:2008-07-01
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